• Home
  • Publications
  • Impact of oxygen on band structure at the Ni/GaN interface revealed by hard X-ray photoelectron spectroscopy

Research Area

Author

  • Hirotaka Mizushima, Ryoji Arai, Yuta Inaba, Shunsuke Yamashita, Yudai Yamaguchi, Yuya Kanitani, Yoshihiro Kudo, Tatsushi Hamaguchi, Rintaro Koda, Katsunori Yanashima, Tadakatsu Ohkubo*, Kazuhiro Hono*, Shigetaka Tomiya

Company

  • Sony Corporation

Venue

  • Applied Physics Letters

Date

  • 2021

Share

Impact of oxygen on band structure at the Ni/GaN interface revealed by hard X-ray photoelectron spectroscopy

View Publication

Abstract

To investigate the impact of oxygen on the band structure at the Ni/p-type GaN interface, the crystal structure and nanoscale impurity distributions were evaluated using transmission electron microscopy and three-dimensional atom probe (3DAP) analysis, respectively. These measurements revealed that the oxygen region existed approximately 5 nm from the GaN surface and that the oxygen concentration was equal to or higher than the Mg acceptor concentration. The band bending and photoelectron spectrum were then simulated using the Mg and oxygen concentration profiles obtained by 3DAP to consider the impact of the interfacial oxygen donors on the photoelectron spectrum measured using hard X-ray photoelectron spectroscopy (HAXPES). The precise band bending was then determined by fitting the simulated spectrum onto the experimental measurements. This showed that the oxygen donors at the interface modulated the band structure and decreased the energy barrier by at least 0.1 eV, which demonstrates the importance of considering the existence of oxygen at the interface. It is, therefore, essential to use techniques like 3DAP and HAXPES to evaluate both the nanoscale impurity distributions and the resulting band structure to fabricate higher-performance devices.

Share

この記事をシェアする